Mobility of Electrons in Compensated Semiconductors. I. Experiment
- 15 December 1967
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 164 (3), 1021-1024
- https://doi.org/10.1103/PhysRev.164.1021
Abstract
Ionized-impurity scattering mobilities were obtained from Hall-mobility measurements for a series of n-type germanium samples between 10 and 40°K. The specimens were prepared by transmutation doping, and contain a constant concentration of minority impurities ( ), while the compensation ratio varies from 0.27 to 0.95. At the low temperatures considered, the number of electrons in the conduction band is very small, and the number of ionized impurities is essentially the same in all samples, . Under these conditions, the screening of scattering centers is due to ionized impurities rather than to electrons, and it is possible to study the dependence of this effect on the concentration of majority impurities.
Keywords
This publication has 13 references indexed in Scilit:
- Mobility of Electrons in Compensated Semiconductors. II. TheoryPhysical Review B, 1967
- Ionized-Impurity Scattering Mobility of Electrons in SiliconPhysical Review B, 1963
- Scattering Anisotropies in-Type SiliconPhysical Review B, 1960
- Impurity Conduction in Transmutation-Doped-Type GermaniumPhysical Review B, 1960
- Ionized-Impurity Scattering Mobility of Electrons in SiliconPhysical Review B, 1959
- Magnetoresistance in-Type Germanium at Low TemperaturesPhysical Review B, 1958
- Electrical Properties of-Type GermaniumPhysical Review B, 1954
- The Combination of Resistivities in SemiconductorsPhysical Review B, 1951
- Neutral Impurity Scattering in SemiconductorsPhysical Review B, 1950
- Theory of Impurity Scattering in SemiconductorsPhysical Review B, 1950