Mathematical model and digital simulation of pulsating overpotential copper electrodeposition
- 1 July 1976
- journal article
- Published by Springer Nature in Journal of Applied Electrochemistry
- Vol. 6 (4), 365-370
- https://doi.org/10.1007/bf00608923
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- The effect of pulsating potential on the morphology of metal deposits obtained by mass-transport controlled electrodepositionJournal of Applied Electrochemistry, 1971