Temperature Changes in Thin Films during Growth by Physical Vapor Deposition. I. Theoretical
- 1 September 1971
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 42 (10), 4063-4070
- https://doi.org/10.1063/1.1659725
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
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- Computer Simulation of Vapor Deposition on Two-Dimensional LatticesJournal of Applied Physics, 1970
- Measurements of Temperature of Thin Metal Films during Vapor DepositionJapanese Journal of Applied Physics, 1968
- Temperature Changes in Thin Metal Films during Vapor DepositionJournal of Applied Physics, 1967
- Nucleation and Growth of Thin Films as Observed in the Electron MicroscopeJournal of Vacuum Science and Technology, 1966
- Trapping and Energy Transfer in Atomic Collisions with a Crystal SurfaceThe Journal of Chemical Physics, 1963
- Thermal aspects of the growth of thin films by vacuum sublimationtPhilosophical Magazine, 1960