Pulsed operation of a MPDR-type ECR-plasma source for high-power applications
- 1 April 1992
- journal article
- Published by AIP Publishing in Review of Scientific Instruments
- Vol. 63 (4), 2550-2552
- https://doi.org/10.1063/1.1142885
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Integrated silicon grid ion extraction system for O2 processesJournal of Vacuum Science & Technology B, 1990
- Modulated discharges: Effect on plasma parameters and depositionJournal of Vacuum Science & Technology A, 1990