Effect of Microscopic Growth Rate on Oxygen Microsegregation and Swirl Defect Distribution in Czochralski‐Grown Silicon
- 1 December 1979
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 126 (12), 2240-2245
- https://doi.org/10.1149/1.2128935