Differences between direct and remote plasma enhanced CVD
- 1 December 1987
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 97-98, 265-268
- https://doi.org/10.1016/0022-3093(87)90063-9
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Deposition of silicon dioxide and silicon nitride by remote plasma enhanced chemical vapor depositionJournal of Vacuum Science & Technology A, 1986
- Thin films of a-Si1−xGex:H alloys by dual magnetron sputtering in a UHV chamberJournal of Vacuum Science & Technology A, 1985
- Ar (3P2) induced chemical vapor deposition of hydrogenated amorphous siliconApplied Physics Letters, 1985
- Product distributions in the reactions of excited noble-gas atoms with hydrogen-containing compoundsThe Journal of Chemical Physics, 1983