Photolithographic Mask Alignment Using Moiré Techniques
- 1 November 1972
- journal article
- Published by Optica Publishing Group in Applied Optics
- Vol. 11 (11), 2455-2459
- https://doi.org/10.1364/ao.11.002455
Abstract
Optics InfoBase is the Optical Society's online library for flagship journals, partnered and copublished journals, and recent proceedings from OSA conferences.This publication has 4 references indexed in Scilit:
- Device Photolithography: An Overview of the New Mask-Making SystemBell System Technical Journal, 1970
- The Development of Alignment Techniques for the Fabrication of Microelectric DevicesHuman Factors: The Journal of the Human Factors and Ergonomics Society, 1969
- Theoretical Interpretation of Moiré PatternsJournal of the Optical Society of America, 1964
- Das Okularinterferometer und das Objektivinterferometer bei der Auflösung der DoppelsterneThe European Physical Journal A, 1926