Abstract
A concentric heat pipe oven is described, which serves as an oven with a highly homogeneous temperature distribution as required by such applications as crystal growing, thermal treatment of materials, and radiation standards. The design is simpler than conventional ovens with similar temperature stability and homogeneity. The temperature control is replaced by a pressure control. This device is used in a modification of the heat pipe oven that generates homogeneous mixtures of a vapor (such as a metal vapor) and an inert gas at well defined total pressure, partial pressure, temperature, and optical path length. All the features of the previously described heat pipe oven are maintained with the additional option that allows quantitative total and partial pressure measurements without relying on vapor pressure curves.