An inorganic resist technology and its applications to LSI fabrication processes
- 1 December 1984
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 2 (4), 281-298
- https://doi.org/10.1016/0167-9317(84)90006-6
Abstract
No abstract availableThis publication has 7 references indexed in Scilit:
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- Edge Sharpening, Contrast Enhancement, And Feature Dependent Amplification In Inorganic Resist - A Simulation StudyPublished by SPIE-Intl Soc Optical Eng ,1983
- Submicron optical lithography using an inorganic resist/polymer bilevel schemeJournal of Vacuum Science and Technology, 1980
- High resolution, steep profile resist patternsJournal of Vacuum Science and Technology, 1979
- A novel inorganic photoresist utilizing Ag photodoping in Se-Ge glass filmsApplied Physics Letters, 1976
- New application of Se-Ge glasses to silicon microfabrication technologyApplied Physics Letters, 1976