Effects of Proton Implantation on Amorphous SiO2 Predamaged by Si Implantation

Abstract
The effects of H implantation on amorphous SiO2 preimplanted with Si have been studied through electron paramagnetic resonance (EPR). It is shown that both the width and intensity of the EPR spectra of the E1 centres generated by Si implantation increase upon H implantation, in contrast to the results for Ar and succeeding H implantation. The difference is ascribed to the difference in the effective cross section of annihilation under proton implantation of the E1 centres in Si- and Ar-implanted SiO2. The result supports the previously propsed model in which the combination of Si and interstitial O reduces the annihilation of the E1 centres.

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