Effect of Dark Space in RF Glow Discharge on Plasma Etching Characteristics

Publisher Website

1 November 1978

journal article
Published by IOP Publishing in Japanese Journal of Applied Physics

Vol. 17 (11), 2071-2072
https://doi.org/10.1143/jjap.17.2071

Abstract

No abstract available

Keywords

PLASMA ETCHING

Cited by 4 articles