Sub-100-nm x-ray mask technology using focused-ion-beam lithography

Publisher Website

1 November 1989

journal article
Published by American Vacuum Society in Journal of Vacuum Science & Technology B

Vol. 7 (6), 1583-1585
https://doi.org/10.1116/1.584493

Abstract

No abstract available

Keywords

FOCUSED ION BEAM

Cited by 13 articles