Diffusivity of helium in fused silica
- 1 August 1973
- journal article
- research article
- Published by AIP Publishing in The Journal of Chemical Physics
- Vol. 59 (3), 1198-1202
- https://doi.org/10.1063/1.1680168
Abstract
A statistical mechanical model of diffusion is applied to helium diffusion in fused silica. The number of gas atoms moving solubility sites is related to the number of atoms in those sites. The number of atoms in the excited state, between two adjacent solubility sites, relative to the number occupying solubility sites can be described by their partition functions. The process of diffusion is treated as a random walk process which results in a diffusion equation in terms of the temperature, fundamental constants, and material parameters. The model is compared to data reported in the literature on He diffusion in fused silica in order to determine the unknown parameters. The model also shows that absolute rate theory is not able to account for the nonlinearity observed in logD vs 1/T for this system.Keywords
This publication has 8 references indexed in Scilit:
- Diffusion and Permeation of He, Ne, Ar, Kr, and D2 through Silicon Oxide Thin FilmsThe Journal of Chemical Physics, 1971
- Temperature Dependence of He Diffusion in Vitreous SiC2Journal of the American Ceramic Society, 1971
- Solubility of Gases in Glass—A Monatomic ModelJournal of Applied Physics, 1970
- Solution and diffusion of helium and neon in tridymite and cristobaliteTransactions of the Faraday Society, 1967
- Theory of Helium Dissolution in Uranium Dioxide. II. Helium SolubilityThe Journal of Chemical Physics, 1965
- Diffusion Coefficients of Helium in Fused QuartzThe Journal of Chemical Physics, 1961
- Calculation of Activation Energy of Ionic Conductivity in Silica Glasses by Classical MethodsJournal of the American Ceramic Society, 1954
- Permeability and Solubility of He3 and He4 in Vitreous Silica1Journal of the American Chemical Society, 1953