Plasma etching of SnO2 films on silicon substrates
- 17 November 1980
- journal article
- research article
- Published by Elsevier in Thin Solid Films
- Vol. 73 (2), L5-L6
- https://doi.org/10.1016/0040-6090(80)90483-6
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Structure, photovoltaic properties, and angle-of-incidence correlations of electron-beam-deposited SnO2/n-Si solar cellsJournal of Applied Physics, 1979
- Electrochemical Patterning of Tin Oxide FilmsJournal of the Electrochemical Society, 1977
- Heterojunction solar cells of SnO2/SiJournal of Electronic Materials, 1977
- Etching methods for indium oxide/tin oxide filmsThin Solid Films, 1976
- Optimisation de la preparation de films minces d'oxyde d'etain par transport en phase gazeuseMaterials Research Bulletin, 1975