Examination of the LTE model for the sputtering process with spectroscopy of ion induced photons (SIIP)
- 1 December 1983
- journal article
- Published by Elsevier in Surface Science
- Vol. 134 (3), 567-576
- https://doi.org/10.1016/0039-6028(83)90059-6
Abstract
No abstract availableKeywords
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