Activation field, fatigue, and waiting-time effects in KNO3 thin-film memories
- 1 December 1987
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 62 (11), 4510-4513
- https://doi.org/10.1063/1.339041
Abstract
By analyzing current transient data i(t) from KNO3 thin‐film memories in terms of the Ishibashi–Takagi parametrization of the Avrami theory, we have been able to extract detailed information concerning the presence of an activation field (and the absence of a threshold), the relationship between characteristic switching time and spontaneous polarization when both are decreased either by increasing temperature or by repetitive read‐write cycles (fatigue), and the behavior of switching kinetics as a function of the delay after application of a dc bias field (‘‘waiting‐time’’).Keywords
This publication has 10 references indexed in Scilit:
- Switching kinetics in KNO3 ferroelectric thin-film memoriesJournal of Applied Physics, 1987
- Raman spectroscopy of submicronfilmsPhysical Review B, 1987
- Analysis of switching transients in KNO3 ferroelectric memoriesApplied Physics Letters, 1986
- Analysis of electrical switching in sub-micron KNO3thin filmsFerroelectrics Letters Section, 1986
- Note on Ferroelectric Domain SwitchingJournal of the Physics Society Japan, 1971
- Ferroelectric Properties of Stable and Metastable Phase-III KNO3Journal of Applied Physics, 1968
- Polarization Reversal in Ferroelectric KNO3Journal of Applied Physics, 1967
- Thickness Dependence of BaTiO3 Switching TimeJournal of Applied Physics, 1962
- Ferroelectric Switching Time of BaTiO3 Crystals at High VoltagesJournal of Applied Physics, 1958
- Granulation, Phase Change, and Microstructure Kinetics of Phase Change. IIIThe Journal of Chemical Physics, 1941