Deep Level Luminescence Ralated to Thermal Donors in Silicon
- 1 September 1983
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 22 (9A), L586
- https://doi.org/10.1143/jjap.22.l586
Abstract
We investigate the origin of the deep level luminescence from Czochralski-grown Si crystals annealed at about 450°C in relation to “thermal donors” (TD's). A sharp line appears at 0.767 eV in luminescence spectra at 4.2 K and 77 K. The appearance condition of this line coincides with that of the TD's. The intensity of the line measured at 77 K reflects the TD concentration. We conclude that the 0.767-eV line is due to a certain form of the oxygen agglomerates transformed from the oxygen complexes responsible for the TD's.Keywords
This publication has 8 references indexed in Scilit:
- Photoluminescence associated with thermally induced microdefects in Czochralski-grown silicon crystalsApplied Physics Letters, 1983
- Thermally-induced defects in silicon containing oxygen and carbonPhysica Status Solidi (a), 1981
- Oxygen-related donor states in siliconApplied Physics Letters, 1981
- Hall-Effect and Photoluminescence Measurements of Oxygen-Related Donors in CZ-Si CrystalsJapanese Journal of Applied Physics, 1980
- Electrical and infrared spectroscopic investigations of oxygen-related donors in siliconPhysica Status Solidi (a), 1979
- Photoluminescence Spectra of Thermal Donors in SiliconJapanese Journal of Applied Physics, 1979
- Resistivity of Bulk Silicon and of Diffused Layers in SiliconBell System Technical Journal, 1962
- Mechanism of the Formation of Donor States in Heat-Treated SiliconPhysical Review B, 1958