Three Dimensional Structures of Negative-tone Photoresist by Binary Optics
- 1 January 2005
- journal article
- Published by Institute of Electrical Engineers of Japan (IEE Japan) in IEEJ Transactions on Sensors and Micromachines
- Vol. 125 (10), 424-425
- https://doi.org/10.1541/ieejsmas.125.424
Abstract
No abstract availableThis publication has 1 reference indexed in Scilit:
- Three Dimensional Micro Fabrication of Photoresist and Resin Materials by Using Gray-scale Lithography and MoldingIEEJ Transactions on Sensors and Micromachines, 2004