Low-temperature process for the preparation of high T c superconducting thin films

Abstract
We have established the low‐temperature process for the preparation of high Tc superconducting films by rf magnetron sputtering. The films were deposited at a temperature (650 °C) lower than the tetragonal‐orthorhombic transition point with sufficient crystallizing and oxidizing conditions. The as‐deposited Er‐Ba‐Cu‐O film on MgO exhibited a sharp superconductive transition with zero resistance at 86 K. This process prevented diffusion at the film and substrate interface and reduced the porous structure in the films.