Kinetic roughening in molecular-beam epitaxy
- 3 June 1991
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 66 (22), 2899-2902
- https://doi.org/10.1103/physrevlett.66.2899
Abstract
We extend a continuum model recently proposed by Villain [J. Phys. I (France) 1, 19 (1991)] to study equilibrium and nonequilibrium diffusion on a high-symmetry surface under a fluctuating particle beam. Exponents characterizing dynamic scaling in various regimes are derived explicitly in all dimensions, as well as the relevant lengths which separate these regimes. Different surface morphologies are correlated with experimentally accessible parameters such as substrate temperature and deposition rate.Keywords
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