Ancillary properties of vapor-deposited carbide coatings
- 1 January 1977
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 40, 201-209
- https://doi.org/10.1016/0040-6090(77)90119-5
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- Activated Reactive Evaporation Process for High Rate Deposition of CompoundsJournal of Vacuum Science and Technology, 1972