Importance of rapid photothermal processing in defect reduction and process integration
- 1 January 1999
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Semiconductor Manufacturing
- Vol. 12 (1), 36-43
- https://doi.org/10.1109/66.744520
Abstract
No abstract availableKeywords
This publication has 26 references indexed in Scilit:
- Design for optimal trajectory tracking in rapid thermal processingPublished by Institute of Electrical and Electronics Engineers (IEEE) ,2002
- Ohmic contacts formation of silicon schottky diodes by screen printing and rapid isothermal processingJournal of Electronic Materials, 1998
- Dependence of activation energy of mass transport limited region on the photospectrum of photons participating in rapid photothermal assisted chemical vapor depositionJournal of Electronic Materials, 1998
- Comparative study of back surface field contact formation using different lamp configurations in rapid thermal processingJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1998
- Role of high energy photons in dual spectral source rapid isothermal CVDJournal of Electronic Materials, 1997
- Rapid Thermal Processing of Screen Printed Ohmic ContactsJournal of the Electrochemical Society, 1997
- Chemical vapor deposition and characterization of amorphous teflon fluoropolymerthin filmsJournal of Electronic Materials, 1997
- A computerized direct liquid injection, rapid isothermal processing assisted chemical vapor deposition system for a Teflon amorphous fluoropolymerReview of Scientific Instruments, 1997
- Fundamentals of Semiconductor Processing TechnologyPublished by Springer Nature ,1995
- Note—An Efficient Goal Programming Algorithm Using Constraint Partitioning and Variable EliminationManagement Science, 1978