Development of high power ch3f laser systems for plasma diagnostics∗
- 30 June 1976
- journal article
- Published by Elsevier in Infrared Physics
- Vol. 16 (4), 429-434
- https://doi.org/10.1016/0020-0891(76)90083-x
Abstract
No abstract availableThis publication has 12 references indexed in Scilit:
- Development of an efficient 9-kW 496-μm CH3F laser oscillatorApplied Physics Letters, 1975
- Pumping and emission characteristics of a 4 kW, submillimeter CH3 F laserOptics Communications, 1975
- Pulsed operation of an optically pumped far-infrared molecular laserIEEE Journal of Quantum Electronics, 1975
- The optically pumped far-infrared laser: Rate equations and diagnostic experimentsIEEE Journal of Quantum Electronics, 1975
- Interaction of Intense Submillimeter Radiation with PlasmasIEEE Transactions on Microwave Theory and Techniques, 1974
- Tokamak diagnostics with the 496-μm CH3F laserNuclear Fusion, 1974
- Spatially Resolved Measurement of Impurities and the Effective Chargein a Tokamak PlasmaPhysical Review Letters, 1974
- Partial vibration energy transfer map for methyl fluoride: A laser fluorescence studyThe Journal of Chemical Physics, 1973
- Submillimeter lasers optically pumped off resonanceOptics Communications, 1972
- Laser Excitation and Equilibration of Excited Vibrational States in CH3FThe Journal of Chemical Physics, 1972