Study of Electron Bombardment of Thin Films

Abstract

An experimental study has been made of methods by which the physical properties of thin metallic films may be changed. In particular, emphasis has been placed on investigating alterations of the crystal structure of certain films subjected to electron bombardment. The films, after being vapor deposited on amorphous substrates, were bombarded by a 35‐kev electron beam in a zone recrystallization process. X‐ray diffraction photographs and photomicrographs indicate substantial crystal growth in films of indium, bismuth, and germanium.