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Measurement of plasma discharge characteristics for sputtering applications
Home
Publications
Measurement of plasma discharge characteristics for sputtering applications
Measurement of plasma discharge characteristics for sputtering applications
EE
E. Eser
E. Eser
RO
R. E. Ogilvie
R. E. Ogilvie
KT
K. A. Taylor
K. A. Taylor
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1 March 1978
journal article
Published by
American Vacuum Society
in
Journal of Vacuum Science and Technology
Vol. 15
(2)
,
199-202
https://doi.org/10.1116/1.569454
Abstract
No abstract available
Keywords
FILMS
ELECTRON TEMPERATURE
DEPOSITION
SPUTTERING
HIGH FREQUENCY
PLASMA DIAGNOSTICS
Cited by 45 articles