Electrical and structural properties of tantalum nitride thin films deposited by sputtering
- 1 March 1979
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 57 (2), 333-336
- https://doi.org/10.1016/0040-6090(79)90174-3
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- Effects of Nitrogen, Methane, and Oxygen on Structure and Electrical Properties of Thin Tantalum FilmsJournal of Applied Physics, 1964