Development of highly reliable Al-Si-Pd alloy interconnection for VLSI
- 6 January 2003
- proceedings article
- Published by Institute of Electrical and Electronics Engineers (IEEE)
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Al-Ti and Al-Ti-Si thin alloy filmsJournal of Applied Physics, 1986
- Aluminum alloy metallization for integrated circuitsThin Solid Films, 1981