Cosputtered Aluminum-Rich AlTa Alloy Films
- 1 December 1973
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Parts, Hybrids, and Packaging
- Vol. 9 (4), 230-233
- https://doi.org/10.1109/tphp.1973.1136740
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
- ErratumThin Solid Films, 1972
- Compositional Control of Tantalum–Aluminum Alloy Films by a dc Biased, ac Sputtering TechniqueJournal of Vacuum Science and Technology, 1972
- Anodic Oxides of Ta–Al Alloy FilmsJournal of Applied Physics, 1971
- Electrical and Structural Properties of Co-Sputtered Tantalum–Aluminum FilmsJournal of Vacuum Science and Technology, 1969
- A NEW STRUCTURE IN TANTALUM THIN FILMSApplied Physics Letters, 1965