Quantitative surface analysis using ion-induced secondary ion and photon emission
- 30 September 1977
- journal article
- Published by Elsevier in Surface Science
- Vol. 66 (2), 423-435
- https://doi.org/10.1016/0039-6028(77)90029-2
Abstract
No abstract availableKeywords
This publication has 17 references indexed in Scilit:
- The spectroscopy of ion-induced photon emission and its application to quantitative surface analysisSurface Science, 1977
- A mass and energy spectrometer for secondary ion analysisJournal of Physics E: Scientific Instruments, 1977
- Evaluation of the local thermal equilibrium model for quantitative secondary ion mass spectrometric analysisAnalytical Chemistry, 1976
- Quantitative analysis of low alloy steels by secondary ion mass spectrometryAnalytical Chemistry, 1976
- On the use of the saha-eggert equation for quantitative sims analysis using argon primary ionsSurface Science, 1976
- An ion beam spectrochemical analyser with application to the analysis of silicate mineralsSpectrochimica Acta Part B: Atomic Spectroscopy, 1975
- Practicality of the thermodynamic model for quantitative ion probe microanalysis of low alloy steelsAnalytical Chemistry, 1975
- Fundamental Studies on Quantitative Analysis in Ion Probe MicroanalyzerJapanese Journal of Applied Physics, 1974
- Thermodynamic approach to the quantitative interpretation of sputtered ion mass spectraAnalytical Chemistry, 1973
- Measurement of the Temperature and Partial Pressure of a Uranium PlasmaApplied Spectroscopy, 1970