A simple apparatus for film thickness measurements
- 1 July 1985
- journal article
- Published by IOP Publishing in Journal of Physics E: Scientific Instruments
- Vol. 18 (7), 574-576
- https://doi.org/10.1088/0022-3735/18/7/008
Abstract
An apparatus and method for thin-film thickness measurements using the multiple-beam interferometric technique of Fizeau fringes are described. The apparatus is simple in construction and to use, inexpensive and portable. It can be used in the range 30-350 nm with an accuracy of 2 nm for film thickness below 100 nm rising for 350 nm films.Keywords
This publication has 3 references indexed in Scilit:
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- A Sensitive Adjustment for Interferometer PlatesJournal of Scientific Instruments, 1950