Xenon fluoride laser excitation by transverse electric discharge
- 15 January 1976
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 28 (2), 86-87
- https://doi.org/10.1063/1.88649
Abstract
Stimulated emission has been produced in mixtures of He, NF3, and Xe at total pressures between 300 and 1000 Torr. Laser emission was on lines at 3511 and 3531 Å which have been associated with the excited XeF molecule. Excitation of the gas mixture was by a transverse electric discharge which produced pulses with peak currents of approximately 104 A and rise times of 20 ns. A maximum laser energy of 7 mJ was obtained from a gas mixture with a ratio of He:Xe:NF3 of 98.0:1.5:0.5 at a total pressure of 300 Torr.Keywords
This publication has 4 references indexed in Scilit:
- High-power xenon fluoride laserApplied Physics Letters, 1975
- Laser action on the 2Σ+1/2→2Σ+1/2 bands of KrF and XeClApplied Physics Letters, 1975
- Stimulated emission at 281.8 nm from XeBrApplied Physics Letters, 1975
- Emission spectrum of XeI in electron-beam—excited Xe/mixturesPhysical Review A, 1975