Plasma enhanced chemical vapour deposition silicon nitride for microelectronic applications
- 31 October 1988
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 164, 309-312
- https://doi.org/10.1016/0040-6090(88)90154-x
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Preparation and Characterization of Plasma‐Deposited Silicon NitrideJournal of the Electrochemical Society, 1984
- A review of recent experiments pertaining to hole transport in Si3N4IEEE Transactions on Electron Devices, 1978
- Electrical properties of Si-N films deposited on silicon from reactive plasmaJournal of Applied Physics, 1978
- Current Transport and Maximum Dielectric Strength of Silicon Nitride FilmsJournal of Applied Physics, 1967