Ellipsometric investigations during titanium deposition in a hollow cathode arc evaporation device
- 1 July 1995
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 263 (1), 18-27
- https://doi.org/10.1016/0040-6090(95)06549-0
Abstract
No abstract availableThis publication has 9 references indexed in Scilit:
- Investigation of the energy transfer to the substrate during titanium deposition in a hollow cathode arcJournal of Vacuum Science & Technology A, 1994
- X-Ray Diffraction Studies and Ellipsometric Diagnostics of Thin α-Ti Growth Films in Plasma Activated Physical Vapour DepositionMaterials Science Forum, 1994
- Plasma activated physical vapour deposition (PAPVD) by hollow cathode arc (HCA)Vacuum, 1990
- A novel derivative ellipsometric method for the study of the growth of thin films: TitaniumThin Solid Films, 1989
- The Accurate Determination of Optical Properties by EllipsometryPublished by Elsevier ,1985
- The development of grain structure during growth of metallic filmsActa Metallurgica, 1984
- Grain structure variation with temperature for evaporated metal filmsJournal of Vacuum Science & Technology A, 1984
- Optical properties of thin filmsThin Solid Films, 1982
- Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatingsJournal of Vacuum Science and Technology, 1974