The deposition rate of plasma‐polymerized ethylene is measured on the electrode and on a substrate placed midway between electrodes in a capacitively coupled system with internal electrodes.Polymerization is carried out under a variety of conditions including low flow rate and pressure, high flow rate and pressure, three frequencies (60 Hz, 10 kHz, 13.56MHz), and with and without a magnetic field at the electrodes. It is found that the low pressure (30–50 mTorr) plasma yields considerably higher conversion of monomer to polymer at the substrate than the high‐pressure plasma (500 mtorr). With a low‐pressure plasma, the use of magnetic field results in higher deposition rates at a given power input. A plasmapolymer which adheres exceptionally well to aluminum is formed only midway between electrodes (not at the electrodes) in the 10‐kHz and 13.56‐Mhz low‐pressure plasma.