Range of electrons and contribution of back-scattered electrons in secondary production in aluminium
- 1 March 1970
- journal article
- Published by IOP Publishing in Journal of Physics D: Applied Physics
- Vol. 3 (3), 349-357
- https://doi.org/10.1088/0022-3727/3/3/315
Abstract
The range of electrons as a function of primary energy below 2 keV, the escape depth of slow secondaries and the efficiency of back-scattered electrons in the production of slow secondaries have been determined in thin aluminium layers deposited on platinum, gold and silver substrates, using an automatic yield measuring device which enables the measurements to be made from contamination-free surfaces.Keywords
This publication has 15 references indexed in Scilit:
- Electron scattering in thick targetsBritish Journal of Applied Physics, 1967
- Multiple scattering of 5-30 keV electrons in evaporated metal films II: Range-energy relationsBritish Journal of Applied Physics, 1964
- Multiple scattering of 5-30 keV electrons in evaporated metal films: I. Total transmission and angular distributionBritish Journal of Applied Physics, 1964
- Interpretation of Range Measurements for Kilovolt Electrons in SolidsPhysical Review B, 1962
- Contribution of Backscattered Electrons to Secondary Electron FormationPhysical Review B, 1961
- Energy Dissipation and Secondary Electron Emission in SolidsPhysical Review B, 1961
- New Method for Range Measurements of Low-Energy Electrons in SolidsJournal of Applied Physics, 1959
- Backscattering of 5–20 kev Electrons from Insulators and MetalsJournal of Applied Physics, 1957
- Zur Rückstreuung von Elektronen im Energiebereich von 10 bis 100 keVAnnalen der Physik, 1957
- Range-Energy Relations for Electrons and the Determination of Beta-Ray End-Point Energies by AbsorptionReviews of Modern Physics, 1952