Reactive ion beam etching of Y-Ba-Cu-O superconductors

Abstract

It has been found that a reactive ion beam etching (RIBE) using Cl₂ gas is useful for microfabrication of Y‐Ba‐Cu‐O superconductors. The etching yield enhancement of Y‐Ba‐Cu‐O is observed for Cl₂ RIBE. The etching yield of Y‐Ba‐Cu‐O at 400 V accelerating voltage, 2×10⁻³ Torr Cl₂ pressure for Cl₂ RIBE is 2, which is twice that for Ar ion beam etching. Y‐Ba‐Cu‐O submicron patterns have been fabricated by focused ion beam lithography and Cl₂ RIBE. Moreover, a Y‐Ba‐Cu‐O superconducting line with a 4‐μm linewidth has been fabricated by annealing an as‐sputtered Y‐Ba‐Cu‐O line pattern.