Reproducible switching effect in thin oxide films for memory applications
Top Cited Papers
- 3 July 2000
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 77 (1), 139-141
- https://doi.org/10.1063/1.126902
Abstract
Thin oxide films with perovskite or related structures and with transition metal doping show a reproducible switching in the leakage current with a memory effect. Positive or negative voltage pulses can switch the resistance of the oxide films between a low- and a high-impedance state in times shorter than 100 ns. The ratio between these two states is typically about 20 but can exceed six orders of magnitude. Once a low-impedance state has been achieved it persists without a power connection for months, demonstrating the feasibility of nonvolatile memory elements. Even multiple levels can be addressed to store two bits in such a simple capacitor-like structure.Keywords
This publication has 19 references indexed in Scilit:
- Study of test structures of a molecular memory elementJournal of Structural Chemistry, 1994
- Localized States in the Gap of Amorphous SemiconductorsPhysical Review Letters, 1976
- Switching and Memory Characteristics of ZnSe - Ge HeterojunctionsJournal of Applied Physics, 1971
- SWITCHING AND NEGATIVE RESISTANCE IN THIN FILMS OF NICKEL OXIDEApplied Physics Letters, 1970
- Electroluminescence, Bistable Switching, and Dielectric Breakdown of Nb2O5 DiodesJournal of Vacuum Science and Technology, 1969
- Switching phenomena in titanium oxide thin filmsSolid-State Electronics, 1968
- BISTABLE SWITCHING IN NIOBIUM OXIDE DIODESApplied Physics Letters, 1965
- Avalanche-Induced Negative Resistance in Thin Oxide FilmsJournal of Applied Physics, 1965
- Switching properties of thin Nio filmsSolid-State Electronics, 1964
- Double Layer Capacities of Single Crystals of Gold in Perchloric Acid SolutionsJournal of the Electrochemical Society, 1962