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An ESCA Study of the Oxide at the Si ‐ SiO2 Interface
Home
Publications
An ESCA Study of the Oxide at the Si ‐ SiO2 Interface
An ESCA Study of the Oxide at the Si ‐ SiO2 Interface
RC
R. A. Clarke
R. A. Clarke
RT
R. L. Tapping
R. L. Tapping
MH
M. A. Hopper
M. A. Hopper
LY
L. Young
L. Young
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1 October 1975
journal article
Published by
The Electrochemical Society
in
Journal of the Electrochemical Society
Vol. 122
(10)
,
1347-1350
https://doi.org/10.1149/1.2134014
Abstract
No abstract available
Cited by 54 articles