A two-stage solution to the anisotropic polysilicon etching problem
- 1 May 1983
- Vol. 33 (5), 291-294
- https://doi.org/10.1016/0042-207x(83)90094-5
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Dimensional Control And Profile Contouring Of Plasma Etched PolysiliconPublished by SPIE-Intl Soc Optical Eng ,1980
- Plasma etching—A discussion of mechanismsJournal of Vacuum Science and Technology, 1979