The contribution of fast neutrals to cathode erosion in glow discharges
- 14 September 1984
- journal article
- Published by IOP Publishing in Journal of Physics D: Applied Physics
- Vol. 17 (9), 1841-1849
- https://doi.org/10.1088/0022-3727/17/9/009
Abstract
The authors calculate the rate at which a target located at the cathode of a glow discharge is sputtered. The calculation involves two steps: (1) evaluation of the energy distribution functions of ions and neutrals impinging on the target; and (2) convolution of these distributions with known sputtering functions. They show that under certain conditions, charge-exchange collisions lead to sputtering predominantly by fast neutrals.Keywords
This publication has 19 references indexed in Scilit:
- The characteristics of the ion and neutral fluxes incident on the substrate in an ion plating dischargeVacuum, 1984
- Energy distributions of particles striking the cathode in a glow dischargePhysical Review A, 1983
- Influence of the sputtering gas pressure on deposition profilesJournal of Vacuum Science & Technology A, 1983
- Slowing down and thermalization of sputtered particle fluxes: Energy distributionsJournal of Applied Physics, 1983
- Calcul exact de la fonction de distribution des ions incidents sur une cible dans le cas d'un plasma de pulvérisationJournal de Physique, 1982
- Relationship between Energetic Neutrals and Impurities in Sputtered FilmsJapanese Journal of Applied Physics, 1979
- Sputtering Process Model of Deposition RateIBM Journal of Research and Development, 1979
- Ion Energies at the Cathode of a Glow DischargePhysical Review B, 1963
- The Mechanism of Electrical Discharges in Gases of Low PressureReviews of Modern Physics, 1940
- Experiments on the length of the cathode dark space with varying current densities and pressures in different gasesProceedings of the Royal Society of London. Series A, Containing Papers of a Mathematical and Physical Character, 1907