Microwave and RF surface wave sustained discharges as plasma sources for plasma chemistry and plasma processing
- 1 March 1986
- journal article
- Published by Springer Nature in Plasma Chemistry and Plasma Processing
- Vol. 6 (1), 79-96
- https://doi.org/10.1007/bf00573823
Abstract
No abstract availableKeywords
This publication has 26 references indexed in Scilit:
- A Review of Instrumentation Used to Generate Microwave-Induced PlasmasApplied Spectroscopy, 1984
- Advances in basic and applied aspects of microwave plasma polymerizationThin Solid Films, 1984
- Développement d'un détecteur à plasma micro-onde pour chromatographie en phase gazeuseCanadian Journal of Chemistry, 1982
- An assessment of an atmospheric pressure helium microwave plasma produced by a surfatron as an excitation source in atomic emission spectroscopySpectrochimica Acta Part B: Atomic Spectroscopy, 1982
- Properties and applications of surface wave produced plasmasRevue de Physique Appliquée, 1982
- Microwave-Supported DischargesApplied Spectroscopy, 1981
- Present status of thin oxide films creation in a microwave plasmaCzechoslovak Journal of Physics, 1980
- Distribution radiale de la densité électronique et de la densité des atomes excités dans une colonne de plasma produite par une onde de surfaceRevue de Physique Appliquée, 1980
- A new microwave plasma at atmospheric pressureSpectrochimica Acta Part B: Atomic Spectroscopy, 1979
- Population Inversion and Continuous Optical Maser Oscillation in a Gas Discharge Containing a He-Ne MixturePhysical Review Letters, 1961