Deposition of Monolayers by Retraction from Solution: Ellipsometric Study of Cetyltrimethylammonium Bromide Adsorption at Silica−Air and Silica−Water Interfaces
- 1 April 1998
- journal article
- Published by American Chemical Society (ACS) in Langmuir
- Vol. 14 (9), 2444-2450
- https://doi.org/10.1021/la971066j
Abstract
No abstract availableKeywords
This publication has 17 references indexed in Scilit:
- Dewetting of Mica Induced by Simple Organic Ions. Kinetic and Thermodynamic StudyLangmuir, 1997
- Thermodynamics of Transfer of Amphiphiles between the Liquid−Air Interface and a Solid SurfaceWetting Tension Study of Langmuir−Blodgett FilmsLangmuir, 1997
- Surfactant self-assembly near contact lines: control of advancing surfactant solutionsColloids and Surfaces A: Physicochemical and Engineering Aspects, 1996
- Equilibrium Wetting Studies of Cationic Surfactant Adsorption on MicaJournal of Colloid and Interface Science, 1996
- Adsorption Behavior of Two Binary Nonionic Surfactant Systems at the Silica−Water InterfaceLangmuir, 1996
- Temporal and Spatial Development of Surfactant Self-Assemblies Controlling Spreading of Surfactant SolutionsLangmuir, 1995
- Thermodynamic Analysis of Solute Effects on Contact Angles. Equilibrium Adsorption of Cationic Surfactants at Silica-Vapor and Silica-Water InterfacesLangmuir, 1995
- Wetting Hysteresis and Instability of Hydrophobized Glass and Mica SurfacesJournal of Colloid and Interface Science, 1993
- Adsorption isotherms for cationic surfactants on silica determined by in situ ellipsometryJournal of Colloid and Interface Science, 1992
- Molecular mechanisms and kinetics during the self-assembly of surfactant layersJournal of Colloid and Interface Science, 1992