Influence of the deposition parameters on the structure of ion-plated chromium
- 1 March 1979
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 58 (1), 121-125
- https://doi.org/10.1016/0040-6090(79)90221-9
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
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- Grain structure of ion-plated coatingsThin Solid Films, 1978
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- Structure and mechanical properties of ion-plated thick filmsJournal of Vacuum Science and Technology, 1975
- Effect of ion bombardment during deposition on thick metal and ceramic depositsJournal of Vacuum Science and Technology, 1974
- Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatingsJournal of Vacuum Science and Technology, 1974
- Fundamentals of Ion PlatingJournal of Vacuum Science and Technology, 1973
- The Influence of Ion Bombardment on the Microstructure of Thick Deposits Produced by High Rate Physical Vapor Deposition ProcessesJournal of Vacuum Science and Technology, 1972