Catalytic Chemical Vapor Deposition (CTL-CVD) Method to Obtain High Quality Amorphous Silicon Alloys

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1 January 1988

journal article
Published by Springer Nature in MRS Proceedings

Vol. 118
https://doi.org/10.1557/proc-118-43

Abstract

No abstract available

Keywords

This publication has 5 references indexed in Scilit:

Chemical Vapor Deposition of a-SiGe:H Films Utilizing a Microwave-Excited Plasma
Japanese Journal of Applied Physics, 1987
High Quality Amorphous Silicon Prepared by Catalytic Chemical Vapor Deposition (CTL-CVD) Method
MRS Proceedings, 1987
Catalytic Chemical Vapor Deposition (CTC–CVD) Method Producing High Quality Hydrogenated Amorphous Silicon
Japanese Journal of Applied Physics, 1986
Guiding Principle in the Preparation of High-Photosensitive Hydrogenated Amorphous Si–Ge Alloys from Glow-Discharge Plasma
Japanese Journal of Applied Physics, 1986
Optical absorption, photoconductivity, and photoluminescence of glow-discharge amorphous ${Si}_{1 - x} {Ge}_{x}$ alloys
Physical Review B, 1982

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