Infrared Transmission Polarizers by Photolithography

Abstract

The design of a grid polarizer is discussed and the effect of supporting it on various substrates is evaluated using a transmission line analogy. A method of making such a grid polarizer by photolithographic techniques is described, and measurements on a device suitable for use at wavelengths between 20 μ and several hundred microns are presented. Their performance compares favorably with polarizers made by other methods.