Thin iron films on Si(111) and formation of a (√3 × √3)R30° structure
- 1 October 1991
- journal article
- Published by Elsevier in Surface Science
- Vol. 256 (1), L589-L592
- https://doi.org/10.1016/0039-6028(91)91189-5
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- The role of surface phases in processes on silicon surfacesSurface Science, 1989
- Structures of iron films deposited on Si(111)7×7 surface studied by LEEDApplied Surface Science, 1988
- Angle resolved ultraviolet photoelectron spectroscopy study of ultrathin iron films on Si(111) surfacesJournal of Vacuum Science & Technology A, 1987
- Quantitative Auger electron spectroscopy using elemental sensitivity factorsJournal of Vacuum Science and Technology, 1976