Critical Domain Size of theStructure for Nucleation and Growth on Si(111) Quenched Surfaces
- 18 September 1995
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 75 (12), 2372-2375
- https://doi.org/10.1103/physrevlett.75.2372
Abstract
In situ scanning tunneling microscopy observations of Si(111) quenched surfaces at 550–700 °C have revealed that isolated domains nucleate or annihilate with a single SF triangle as a building unit and that there exists a critical nucleus size for domain growth. This critical size has a temperature dependence which has been theoretically discussed using the two-dimensional nucleation and growth theory.
Keywords
This publication has 21 references indexed in Scilit:
- An hypothesis on the role of oxygen in the Si(111)-1 × 1 → 7 × 7 phase transitionSurface Science, 1992
- Ab initiotheory of the Si(111)-(7×7) surface reconstruction: A challenge for massively parallel computationPhysical Review Letters, 1992
- Ab initiototal-energy calculations for extremely large systems: Application to the Takayanagi reconstruction of Si(111)Physical Review Letters, 1992
- Model for the energetics of Si and Ge (111) surfacesPhysical Review B, 1987
- Structure analysis of Si(111)-7 × 7 reconstructed surface by transmission electron diffractionSurface Science, 1985
- Structural analysis of Si(111)-7×7 by UHV-transmission electron diffraction and microscopyJournal of Vacuum Science & Technology A, 1985
- 7 × 7 Reconstruction on Si(111) Resolved in Real SpacePhysical Review Letters, 1983
- Silicon surface structures after pulsed laser annealingSurface Science, 1980
- Chemisorption and ordered surface structuresSurface Science, 1964
- Structure and Adsorption Characteristics of Clean Surfaces of Germanium and SiliconThe Journal of Chemical Physics, 1959