A New Positive-Type Photosensitive Alkaline-Developable Alicyclic Polyimide Based on Poly(amic acid silylester) as a Polyimide Precursor and Diazonaphthoquinone as a Photosensitive Compound
- 9 March 2002
- journal article
- research article
- Published by American Chemical Society (ACS) in Chemistry of Materials
- Vol. 14 (4), 1762-1766
- https://doi.org/10.1021/cm0115362
Abstract
No abstract availableKeywords
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