Influence of molecular dissociation and degree of ionization on rare gas–halide laser properties
- 1 April 1978
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 32 (7), 424-426
- https://doi.org/10.1063/1.90071
Abstract
The influence of F2 dissociation and the accompanying increase in fractional ionization is examined for conditions typical of electron‐beam‐sustained KrF* lasers. It is found that for electron‐density–F2‐density ratios greater than about 10−3, rare‐gas metastable loss due to electron excitation of higher levels begins to compete significantly with metastable‐F2 reactions, thereby leading to a substantial reduction in rare gas–halide production efficiency.Keywords
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