Effects of Postdeposition Annealing Treatments on Charge Trapping in CVD Al[sub 2]O[sub 3] Films on Si
- 1 January 1973
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 120 (12), 1707
- https://doi.org/10.1149/1.2403349